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Surface Processing
In our class 1000 clean room facility, using semiconductor processing techniques, we image and deposit the electrodes and pixilated patterns necessary for the wide range of radiation detection and imaging applications we support. This process includes thin film metallization, reactive ion sputtering for passivation, and custom designed lithographic patterning. |
Our precision mechanical and chemical polishing processes are utilized to prepare our detectors for electrode deposition. Complex preparation and detailed quality control methods are employed to ensure product uniformity across the wide range of specifications and detector configurations that we support.
Photolithography